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UHV Characterization & Growth System

Instrument types

UHV Characterization & Growth System:  This system is designed for high throughput experimental sample production and characterization to study both pre- and post graphene growth processes. The system has a two-stage load-lock for rapid introduction of either single 12mm x 6 mm sample or up to four simultaneous 5mm x 4mm samples.  The system is equipped with low energy electron diffraction (LEED) and Auger electron spectroscopy (AES) for preliminary assessment of sample quality and graphene film thickness.

Remote Access to Instrument: 
No