Northwestern University's MRSEC has recently augmented the cababilities of its Materials Processing Microfabrication Facility:
- The Atomic Layer Deposition (ALD) instrument can be used for deposition of dielectric thin films with conformal film growth on ultra-high aspect ratio features.
- A Variable Temperature Hall Effect Measurement System (HMS) is capable of Direct and Derived Measurements as a Function of Field and Temperature: Hall voltage, Resistivity, Hall coefficient, Carrier type / concentration / density, Hall mobility, Magnetotransport.
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