Nitrogen/vacuum polyimide film anneal. Temp to 300 C.

• Diode laser compatible with standard 365 nm UV photoresists
• Standard write mode can pattern features down to one micron
• High resolution write mode can pattern features down to 300 nm lines and spaces, in sufficiently thin resist
• Accepts substrates of any shape (round or square preferred)
• Accepts transparent or opaque substrates
• Accepts substrates as small as 5 mm x 5 mm (larger substrates preferred)
• Automatic focus via optical or pneumatic systems