Our optical lithography capability includes:
- I-line (365 nm) stepper photolithography (STP01) to linewidths of ~0.70 microns
- Contact photolithography to ~2 microns (ALN01, ALN02)
- Standard Shipley 1813, 220 photolithography processes and both positive and negative reversal processes for AZ5214
- Shipley LOR2A and LOR5A bilayer processes for robust liftoff processes
- Standard SU-8 negative resist processes
MRFN.org is supported by the MRSEC Program of the National Science Foundation. Image in the header is courtesy of CRISP MRSEC.