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University of Utah
Next Generation Materials for Plasmonics and Organic Spintronics
UtahNanofab
Facility Primary Contact:
Ian Harvey
Instrument Technical Primary Contact:
Charles Fisher
More details about this Instrument
PECVD Deposition
Make / Model :
Oxford 80+
Oxford 80+ PECVD chamber capable of depositing Si3N4, SiONx, and SiO2 films.
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