Skip to:

MRFN Member Login
Program Application

Focused Ion Beam

Instrument types

Our dual-beam FIB system combines a gallium ion beam column with a SEM column to provide a versitile instrument for preparing cross-sectioned samples and thin TEM slices. The electron column allows the user to view and move the substrate without damage, and the ion beam is used for cutting, milling and metal deposition. The tool is equipped with a source of platinum for patterning of wires or protection patches, and with a source of XeF2 for rapid etching of silicon, nitrides and oxides. An Omniprobe manipulator allows the user to lift out TEM samples and to place them in situ on TEM grids.

Accel. voltage 30 kV
Electron resolution @30kV     20 nm
Ga ion resolution    50 nm