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University of Wisconsin-Madison
Materials Research Science and Engineering Center on Structured Interfaces
The Nanoscale Fabrication Center (NFC)
Instrument Technical Primary Contact:
Jerry Hunter
More details about this Instrument
Polysilicon LPCVD Furnace
Instrument types
Thin Film Deposition
Make / Model :
TYSTAR Poly
Polysilicon LPCVD in SiH4; PH3 may be added as dopant.
Remote Access to Instrument:
No
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